Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

The European Mask and Lithography Conference (EMLC) 2024 recently was held in Grenoble, France, and had about 190 participants from a wide range of companies and institutions. Being relatively new to ...

Startup Substrate is building next-generation semiconductor fabs using advanced X-ray lithography. This goes beyond extreme ...

Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...

The eBeam initiative celebrated its 15 th anniversary at the recent SPIE Advanced Lithography + Patterning Conference. 130 members of the mask and lithography community attended the annual lunch to ...

In a breakthrough set to revolutionize the semiconductor industry, the School of Engineering of the Hong Kong University of ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

Photronics Inc. today announced its Sub-Wavelength Reticle Solutions phase shift photomasks have been used to demonstrate the production of sub-100nm features using KrF (248nm) exposure technology.

What is the Market Size of EUV Mask Blanks? BANGALORE, India, Dec. 18, 2025 /PRNewswire/ -- The global market for EUV Mask Blanks was valued at USD 591 Million in the year 2024 and is projected to ...