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在ASML下一代的高數值孔徑EUV設備 (High-NA EUV system) 中，反射鏡的技術已發展至登峰造極：如果將設備中的一面反射鏡想像成地球的大小，那麼鏡面上最大的誤差就只有人類頭髮那麼小！讓我們向創造如此工藝極限的合作夥伴 ZEISS Semiconductor Manufacturing Technology 致敬🌟 #ASML #EUV #ZEISS | ASML
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